prBAS ISO 14606:2025

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials


General information
Status:Project
Number of pages:21
Adoption method:Korice
Language:engleski
Edition:3.
Realization date:20.11.2024
Forseen date for next stage code:10.03.2025
Technical committee:BAS/TC 49, Chemical engineering, laboratory equipment and cosmetics
ICS:
71.040.40, Chemical analysis

Abstract
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.

Lifecycle
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Original document and degree of correspondence
ISO 14606:2022, identical

Relation to BAS standards

Work material

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