prBAS ISO 14606:2025
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
General information
Status:Project
Number of pages:21
Adoption method:Korice
Language:engleski
Edition:3.
Realization date:07.11.2024
Forseen date for next stage code:19.11.2024
Technical committee:BAS/TC 49, Chemical engineering, laboratory equipment and cosmetics
ICS:
71.040.40, Chemical analysis
Abstract
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
Lifecycle
...
Original document and degree of correspondence
ISO 14606:2022, identical
Relation to BAS standards
Work material
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