prBAS ISO 23170:2025

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

General information

Status:Project

Number of pages:33

Adoption method:Korice

Language:engleski

Edition:1.

Realization date:07.11.2024

Forseen date for next stage code:19.11.2024

Technical committee:BAS/TC 49, Chemical engineering, laboratory equipment and cosmetics

ICS:

71.040.40, Chemical analysis

Abstract

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

Lifecycle

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Original document and degree of correspondence

ISO 23170:2022, identical

Work material

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